In-situ nanoscale characterization of composition and structure during formation of ultrathin nickel silicide

We characterize composition and structure of ultrathin nickel silicide during formation from 3 nm Ni films on Si(1 0 0) using in-situ high-resolution ion scattering transmission electron microscopy. show the transition to occur in discrete steps, which an intermediate phase is observed within a narrow range temperature 230 °C 290 °C. The film this found be 50% Ni:50% Si, without evidence for long-range structure, indicating homogeneous monosilicide NiSi phase. final resemblant cubic disilicide NiSi2, but with slightly off-stoichiometric 38% 62% Si. Along [1 0] axis, lattices substrate are perfect alignment. Due epitaxial growth silicide, contraction c lattice constant by 0.7–1% detected.