In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

In Situ Reaction Mechanism Studies on Atomic Layer Deposition

Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure

In this report, we study the effectiveness of hydrogen plasma surface treatments for improving the electrical properties of GaSb/Al2O3 interfaces. Prior to atomic layer deposition of an Al2O3 dielectric, p-GaSb surfaces were exposed to hydrogen plasmas in situ, with varying plasma powers, exposure times, and substrate temperatures. Good electrical interfaces, as indicated by capacitance-voltage...

Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry

• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version ...

In situ atomic layer deposition half cycle study of Al2O3 growth on AlGaN

Related Articles Ethanol-enriched low-pressure chemical vapor deposition ZnO bilayers: Properties and growth—A potential electrode for thin film solar cells J. Appl. Phys. 113, 024908 (2013) Influence of stress on structural properties of AlGaN/GaN high electron mobility transistor layers grown on 150 mm diameter Si (111) substrate J. Appl. Phys. 113, 023510 (2013) High p-type conduction in hig...

Epitaxial graphene surface preparation for atomic layer deposition of Al2O3

Atomic layer deposition was employed to deposit relatively thick ( 30 nm) aluminum oxide (Al2O3) using trimethylaluminum and triply-distilled H2O precursors onto epitaxial graphene grown on the Si-face of silicon carbide. Ex situ surface conditioning by a simple wet chemistry treatment was used to render the otherwise chemically inert graphene surface more amenable to dielectric deposition. The...