Influence of magnetron sputtering process parameters on low-temperature electrical transport characteristics of zirconium oxynitride thin films

Influence of aging temperature on phase transformation and mechanical behavior of NiTi thin films deposited by magnetron sputtering technique

In this study, NiTi thin films were deposited on the glass and NaCl substrates by means of magnetron sputtering method. The influence of aging temperature, over the range 300-500 oC, on phase transformation and mechanical properties of the sputtered NiTi thin films were studied by differential scanning calorimetry (DSC) and nano-indentation assay, respectively. The DSC curves showed that the ag...

Development of Zirconium Thin Films by Pulsed Direct Current Magnetron Sputtering: Effect of Pulsed Parameters

This paper characterizes phases present in thin Zr films at 773 K of substrate temperature. The effect of pulsed parameters such as pulse frequency, duty cycle and pulse power during the deposition of Zr film on Si(100) at the substrate temperature of 773 K has been studied. Formation of α-phase of zirconium was noticed with (001) preferred orientation at 773 K. Preferred orientation was found ...

Mechanical Properties and Microstructural Evolution of Ta/TaNx Double Layer Thin Films Deposited by Magnetron Sputtering

Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...

Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin films

Effect of Thickness on Properties of Copper Thin Films Growth on Glass by DC Planar Magnetron Sputtering

Copper thin films with nano-scale structure have numerous applications in modern technology.  In this work, Cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The thickness effect on the structural, mo...