Interference system for high pressure environment

Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top material. It offers fast over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both micro sub-micro scale. In this manuscript is presented novel concept combine high-pressure environment. With aid system, it control environment add co-solvents desired state (liquid, gas, supercritical) use developed system controlled reactive future studies. Two systems were assembled for testing proofing concept. The results two 4-beam (lens- mirror-based) compared.