Introduction to passive electron intensity modulation

Introduction to passive electron intensity modulation

This work introduces a new technology for electron intensity modulation, which uses small area island blocks within the collimating aperture and small area island apertures in the collimating insert. Due to multiple Coulomb scattering, electrons contribute dose under island blocks and lateral to island apertures. By selecting appropriate lateral positions and diameters of a set of island blocks...

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

Introduction to the Electron Theory of Metals

I. Introduction to Ultrafast Electron Diffraction

Ultrafast electron diffraction (UED) is a powerful method for studying time-resolved structural changes. Currently, space charge induced temporal broadening prevents obtaining high brightness electron pulses with sub-100 fs durations limiting the range of phenomena that can be studied with this technique. We review the state of the the art of UED in this respect and propose a practical design f...

Introduction to high-resolution cryo-electron microscopy.

For many years two techniques have dominated structural biology - X-ray crystallography and NMR spectroscopy. Traditional cryo-electron microscopy of biological macromolecules produced macromolecular reconstructions at resolution limited to 6-10 Å. Recent development of transmission electron microscopes, in particular the development of direct electron detectors, and continuous improvements in ...