Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: IEEE Transactions on Plasma Science
سال: 1986
ISSN: 0093-3813
DOI: 10.1109/tps.1986.4316522