Monitoring Carbon in Electron and Ion Beam Deposition within FIB-SEM

It is well known that carbon present in scanning electron microscopes (SEM), Focused ion beam (FIB) systems and FIB-SEMs, causes imaging artefacts influences the quality of TEM lamellae or structures fabricated FIB-SEMs. The severity such effects depends not only on quantity but also its bonding state. Despite this, presence state regularly monitored Here we demonstrated Secondary Electron Hyperspectral Imaging (SEHI) can be implemented different FIB-SEMs (ThermoFisher Helios G4-CXe PFIB Nanolab G3 UC) used to observe built up/removal changes resulting from electron/ion exposure. As as ability monitor, this study showed capability Plasma FIB Xe exposure remove contamination surface a Ti6246 alloy without requirement chemical treatments.