Nanoimprint with CO<sub>2</sub> Ambient
نویسندگان
چکیده
In Jet and Flash Imprint Lithography (JFIL), ambient gas is trapped between the resist, substrate mold. The volume of estimated about 9.7 ~ 21.5% resist volume. It takes time for bubbles to disappear in closed space. By using carbon dioxide as atmospheric applying an organic layer such Spin on Carbon (SOC) top surface substrate, it proposed by theoretical calculation that disappearance shortened throughput improved. When thickness SOC was 5 nm or more, indicated shorter than helium ambient.
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2022
ISSN: ['0914-9244', '1349-6336']
DOI: https://doi.org/10.2494/photopolymer.35.105