Nucleation sites of expanded stacking faults detected by <i>in operando</i> x-ray topography analysis to design epitaxial layers for bipolar-degradation-free SiC MOSFETs
نویسندگان
چکیده
We investigated the nucleation sites of expanded single Shockley-type stacking faults (1SSFs) in a silicon carbide (SiC) metal–oxide–semiconductor field effect transistor (MOSFET) and demonstrated epitaxial layers designed for bipolar-degradation-free SiC MOSFETs. Since sufficient hole density just below basal plane dislocation (BPD)-threading edge (TED) conversion points induces 1SSF expansion, we derived dependence depth on applied current condition from BPD-TED 1SSFs. first simulated determined three-step conditions to body diode MOSFET so that amount holes would be supplied drift layer, buffer inside substrate MOSFET. An operando x-ray topography analysis was conducted with dynamically visualizing expansion motions, 1SSFs at different forward densities were successfully extracted. The depths extracted analyzed, it experimentally clarified these depths, i.e., 1SSFs, became deeper densities. bipolar degradation characteristics MOSFETs evaluated as function density, validity simulation model verified by experimental results. also confirmed can suppressed some extent using low BPD high-nitrogen-concentration layer showed high reliability under operation. Depending application MOSFETs, should prevent exceeding threshold expansion.
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2022
ISSN: ['2158-3226']
DOI: https://doi.org/10.1063/5.0079925