Optical manipulation of work function contrasts on metal thin films
نویسندگان
چکیده
منابع مشابه
Optical manipulation of work function contrasts on metal thin films
Work function is a crucial metric in every optoelectronic device to ensure a specific charge transport scheme. However, the number of stable conductive materials available in a given work function range is scant, necessitating work function modulation. As opposed to all the previous chemical methods of work function modulation, we introduce here an alternative approach involving optical modulat...
متن کاملNonlinear optical phenomena on rough surfaces of metal thin films
Nonlinear optical phenomena on rough self-affine metal surfaces are theoretically studied. Placing nonlinearly polarizable molecules on such surfaces results in strong enhancement of optical nonlinearities. A quasistatic approximation is used to calculate local-enhancement factors for the second and third harmonic generation, degenerate four-wave mixing, and nonlinear Kerr effect. The calculati...
متن کاملOPTICAL PROPERTIES OF THIN Cu FILMS AS A FUNCTION OF SUBSTRATE TEMPERATURE
Copper films (250 nm) deposited on glass substrates, at different substrate temperatures. Their optical properties were measured by ellipsometery (single wavelength of 589.3 nm) and spectrophotometery in the spectral range of 200–2600 nm. Kramers Kronig method was used for the analysis of the reflectivity curves of Cu films to obtain the optical constants of the films, while ellipsometery measu...
متن کاملThe Response of Work Function of Thin Metal Films to Interaction with Hydrogen
The aim of this paper is to summarize the results of experiments carried out at our laboratory on the response of the work function of several thin films of transition metals and rare earth metals to interaction with molecular hydrogen. The main focus concerns the description of surface phenomena accompanying the reaction of hydride formation as a result of the adsorbate’s incorporation into th...
متن کاملStructural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films
Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Science Advances
سال: 2018
ISSN: 2375-2548
DOI: 10.1126/sciadv.aao6050