Preparation of Compositionally Gradient Al-AlN Films by rf Reactive Sputtering
نویسندگان
چکیده
منابع مشابه
Study of Properties of AlN Thin Films Deposited by Reactive Magnetron Sputtering
Study of Aluminum nitride (AlN) thin film deposited on silicon wafer and glass substrates by DC magnetron sputtering technique at different power variation. The X-ray diffraction and Fourier transform infrared spectroscopy (FTIR) study revealed the formation of the AlN phase. The optical characteristics of films, such as refractiveindex, extinction coefficient, and average thickness, were calcu...
متن کاملXRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition
AlN thin films have been grown on R((1-12) surface-cut)-Al2O3, SiO2-glass and C((001) surface-cut)-Al2O3 substrates, by using a reactive-RF-sputter-deposition method. X-ray diffraction (XRD) shows that AlN film has (110) orientation of wurtzite crystal structure for R-Al2O3 and (001) orientation for SiO2-glass and C-Al2O3 substrates. The film thickness was analyzed by Rutherford backscattering ...
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CuFeO2 is a delafossite-type compound and is a well known p-type semiconductor. The growth of delafossite CuFeO2 thin films on conventional glass substrate by radio-frequency sputtering is reported. The deposition, performed at room temperature leads to an amorphous phase with extremely low roughness and high density. The films consisted of a well crystallized delafossite CuFeO2 after heat trea...
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Though tungsten trioxide (WO3) in bulk, nanosphere, and thin film samples has been extensively studied, few studies have been dedicated to the crystallographic structure of WO3 thin films. In this work, the evolution from amorphous WO3 thin films to crystalline WO3 thin films is discussed. WO3 thin films were fabricated on silicon substrates (Si/SiO2) by RF reactive magnetron sputtering. Once a...
متن کاملREACTIVE PULSE MAGNETRON SPUTTERING FOR THE DEPOSITION OF HIGH QUALITY AlN THIN FILMS
Aluminium nitride is a promising coating material for many applications, due to its good physical and mechanical properties. Hard transparent Aluminium nitride thin films have been deposited by bipolar reactive pulsed magnetron sputtering (PMS). With its inherent advantages of energetic particle bombardment of the growing film and minimal arcing tendency even in dielectric layer deposition proc...
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ژورنال
عنوان ژورنال: Journal of the Japan Institute of Metals and Materials
سال: 1994
ISSN: 0021-4876,1880-6880
DOI: 10.2320/jinstmet1952.58.2_194