PVD and CVD Technologies in Semiconductor Device Fabrication
نویسندگان
چکیده
منابع مشابه
Scheduling Semiconductor Wafer Fabrication
This paper is concerned with assessing the impact that scheduling can have on the performance of semiconductor wafer fabrication facilities. The performance measure considered here is the mean throughput time (sometimes called cycle time, turnaround time or manufacturing interval) for a lot of wafers. A variety of input control and sequencing rules are evaluated using a simulation model of a re...
متن کاملCVD and PVD coating process modelling by using artificial neural networks
Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of in...
متن کاملSemiconductor Device Simulation by a New Method of Solving Poisson, Laplace and Schrodinger Equations (RESEARCH NOTE)
In this paper, we have extended and completed our previous work, that was introducing a new method for finite differentiation. We show the applicability of the method for solving a wide variety of equations such as Poisson, Lap lace and Schrodinger. These equations are fundamental to the most semiconductor device simulators. In a section, we solve the Shordinger equation by this method in sever...
متن کاملHighlights in Semiconductor Device Development
The agricultural civilization in the cultural history of man was said to be the result of two genetic accidents which gave birth to a new species of bread wheat some 10,000 years ago, involving wild wheat and goat grass. Large-scale agricultural activity in man's society followed. Great inventions or discoveries could be considered to be such genetic accidents-mutations. New knowledge, arising ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Jitsumu Hyomen Gijutsu
سال: 1981
ISSN: 1884-3417,0368-2358
DOI: 10.4139/sfj1970.28.294