Scaling behavior of columnar structure during physical vapor deposition

’Power law scaling during physical vapor deposition under extreme shadowing conditions

A qualitative model that relates the period of the surface roughness to the vertical and spherical growth rates of glancing angle deposited GLAD nanorods suggests that rod self-shadowing is responsible for the previously reported temperature dependence in the rod width. Atomic shadowing interactions between neighboring rods as well as surface islands on the rod growth fronts control the morphol...

Temperature-induced chaos during nanorod growth by physical vapor deposition

Atomic shadowing during kinetically limited physical vapor deposition causes a chaotic instability in the layer morphology that leads to nanorod growth. Glancing angle deposition GLAD experiments indicate that the rod morphology, in turn, exhibits a chaotic instability with increasing surface diffusion. The measured rod width versus growth temperature converges onto a single curve for all metal...

Physical Vapor Deposition Simulations of Microstructure Evolution

Vacancy Formation during Vapor Deposition

A hybrid modeling approach combining two-dimensional atomistic molecular dynamics simulations of vacancy formation with a continuum analysis of vacancy diffusion has been used to predict the vacancy content of vapor deposited nickel as a function of deposition rate/temperature and incident flux energy/angle. The hybrid approach uses a previously developed molecular dynamics technique to obtain ...

Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition

Ionized metal physical vapor deposition is being increasingly used to deposit diffusion barriers and Cu seed layers into high aspect ratio trenches for microelectronics fabrication. Hollow cathode magnetrons HCMs represent a technology capable of depositing metal over large areas at pressures of a few millitorrs. The fundamental mechanisms of these devices are not well understood and so their o...