Selective visualization of gene structure with ultraviolet light.
نویسندگان
چکیده
منابع مشابه
Experimental Visualization of Labyrinthine Structure with Optical Coherence Tomography
Introduction:Visualization of inner ear structures is a valuable strategy for researchers and clinicians working on hearing pathologies. Optical coherence tomography (OCT) is a high-resolution imaging technology which may be used for the visualization of tissues. In this experimental study we aimed to evaluate inner ear anatomy in well-prepared human labyrinthine bones.Materials and Methods:Thr...
متن کاملRegulation of ultraviolet light-induced gene expression by gene size.
UV light induces the expression of a wide variety of genes. At present, it is unclear how cells sense the extent of DNA damage and alter the expression of UV-induced genes appropriately. UV light induces DNA damage that blocks transcription, and the probability that a gene sustains transcription-blocking DNA damage is proportional to locus size and dose of UV light. Using colon carcinoma cells ...
متن کاملexperimental visualization of labyrinthine structure with optical coherence tomography
introduction:visualization of inner ear structures is a valuable strategy for researchers and clinicians working on hearing pathologies. optical coherence tomography (oct) is a high-resolution imaging technology which may be used for the visualization of tissues. in this experimental study we aimed to evaluate inner ear anatomy in well-prepared human labyrinthine bones.materials and methods:thr...
متن کاملUltraviolet Light
Ultraviolet light (UV) is a recognized disinfection alternative to chlorine and ozone in many applications from drinking water to wastewater treatment. UV provides effective disinfection without production of problematic disinfection byproducts. Information on the mechanism and application of UV for drinking water disinfection is presented. Advantages and disadvantages of the technique are disc...
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In order to address the crucial problem of high-resolution low line-edge roughness resist for extreme ultraviolet (EUV) lithography, researchers require significant levels of access to high-resolution EUV exposure tools. The prohibitively high cost of such tools, even microfield tools, has greatly limited this availability and arguably hindered progress in the area of EUV resists. To address th...
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ژورنال
عنوان ژورنال: Proceedings of the National Academy of Sciences
سال: 1988
ISSN: 0027-8424,1091-6490
DOI: 10.1073/pnas.85.3.654