Self-Assembled Quantum Dots of In-Base III-V Compound Semiconductors Grown by Molecular Beam Epitaxy.
نویسندگان
چکیده
منابع مشابه
The evolution of self-assembled InAs/GaAs(001) quantum dots grown by growth-interrupted molecular beam epitaxy.
Self-assembled InAs quantum dots (QDs) grown on GaAs(001) by molecular beam epitaxy under continuous and growth-interruption modes exhibit two families of QDs, quasi-three-dimensional (quasi-3D; Q3D) and three-dimensional (3D) QDs, whose volume density evolution is quantitatively described by a classical rate-equation kinetic model. The volume density of small Q3D QDs decreases exponentially wi...
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We report on realization and transport spectroscopy study of single quantum dots (QDs) made from InSb nanowires grown by molecular beam epitaxy (MBE). The nanowires employed are 50-80 nm in diameter and the QDs are defined in the nanowires between the source and drain contacts on a Si/SiO2 substrate. We show that highly tunable QD devices can be realized with the MBE-grown InSb nanowires and th...
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متن کامل
Chapter 3 . Gas Source Molecular Beam Epitaxy of Compound Semiconductors
This research program utilizes the chemical beam epitaxy laboratory and emphasizes the epitaxial growth of a wide variety of compound semiconductors (both Il-VI and Ill-V), as well as multilayered structures composed of II-VI/II-VI, II-VI/III-V and Ill-V/III-V heterostructures. The chemical beam epitaxy laboratory consists of two gaseous source epitaxy reactors (Il-VI dedicated and Ill-V dedica...
متن کاملChapter 3 . Gas Source Molecular Beam Epitaxy of Compound Semiconductors
Current state-of-the-art epitaxial growth techniques employ various metalorganic and hydride gases to deliver constituent species to the substrate surface, particularly high vapor pressure species such as phosphorus and sulfur. Gas source molecular beam epitaxy (GSMBE) utilizes hydride gas sources and solid elemental sources. The more conventional growth approach, molecular beam epitaxy (MBE), ...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1997
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.40.325