Transport across meso-junctions of highly doped Si with different superconductors

نویسندگان

چکیده

We studied the transport properties of meso-junctions semiconducting (Sm) highly doped Si with different superconductors (Sc) through point contact Andreev reflection (PCAR) spectroscopy. Spectra low transparency contacts between and In showed an enhancement in superconducting energy gap In. This was due to effect additional arising from Schottky barrier at Sm-Sc interface. For higher Si-Nb Si-Pb contacts, no observed though there were weak sub features. These proximity induced interface superconductivity known occur for junctions high transparency.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Highly efficient charge separation and collection across in situ doped axial VLS-grown Si nanowire p-n junctions.

VLS-grown semiconductor nanowires have emerged as a viable prospect for future solar-based energy applications. In this paper, we report highly efficient charge separation and collection across in situ doped Si p-n junction nanowires with a diameter <100 nm grown in a cold wall CVD reactor. Our photoexcitation measurements indicate an internal quantum efficiency of ~50%, whereas scanning photoc...

متن کامل

Charge transport in junctions between d-wave superconductors.

We develop a microscopic analysis of superconducting and dissipative currents in junctions between superconductors with d-wave symmetry of the order parameter. We study the proximity effect in such superconductors and show that for certain crystal orientations the superconducting order parameter can be essentially suppressed in the vicinity of a nontransparent specularly reflecting boundary. Th...

متن کامل

Lattice location of implanted Cu in highly doped Si

We report on the lattice location of ion-implanted Cu in pand n-Si using the emission channeling technique. Following room-temperature implantation, the majority of Cu was found on near-substitutional sites in both pand n-Si. Annealing in the temperature range 200-600°C resulted in changes of near-substitutional Cu to random sites in p-Si, while in n-Si all of the near-substitutional Cu was con...

متن کامل

Electrical transport properties of Si-doped hexagonal boron nitride epilayers

The suitability of Si as an n-type dopant in hexagonal boron nitride (hBN) wide bandgap semiconductor has been investigated. Si doped hBN epilayers were grown via in-situ Si doping by metal organic chemical vapor deposition technique. Hall effect measurements revealed that Si doped hBN epilayers exhibit n-type conduction at high temperatures (T > 800 K) with an in-plane resistivity of ∼12 · cm,...

متن کامل

Highly conductive Sb-doped layers in strained Si

The ability to create stable, highly conductive ultrashallow doped regions is a key requirement for future silicon-based devices. It is shown that biaxial tensile strain reduces the sheet resistance of highly doped n-type layers created by Sb or As implantation. The improvement is stronger with Sb, leading to a reversal in the relative doping efficiency of these n-type impurities. For Sb, the p...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Physics Letters

سال: 2021

ISSN: ['1873-2429', '0375-9601']

DOI: https://doi.org/10.1016/j.physleta.2020.127115