Unevenly spaced continuous measurement approach for dual rotating–retarder Mueller matrix ellipsometry
نویسندگان
چکیده
منابع مشابه
ellipsometry and Mueller matrix polarimetry
We characterized two samples consisting of photoresist layers on silicon with square arrays of square holes by spectroscopic ellipsometry (SE) and Mueller matrix polarimetry (MMP). Hole lateral dimensions and depths were determined by fitting either SE data taken in conventional planar geometry or MMP data in general conical diffraction configurations. A method for objective determination of th...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2019
ISSN: 1094-4087
DOI: 10.1364/oe.27.014736