Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications
نویسندگان
چکیده
منابع مشابه
Reactive ion etching of quartz and Pyrex for microelectronic applications
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ژورنال
عنوان ژورنال: Scientific Reports
سال: 2017
ISSN: 2045-2322
DOI: 10.1038/s41598-017-04389-y