X-ray metrology for advanced microelectronics

X-Ray Metrology for Quality Assurance

There is considerable current interest in deriving accurate dimensional measurements of the internal ge ometry of complex manufactured parts particularly castings This paper describes an approach to the re construction of D part geometry from multiple dig ital X ray images A novel method for radiographic stereo is described which takes into account the spe cial imaging geometry of the digital X...

Reliability Considerations for Advanced Microelectronics

Recent advances in the design and fabrication techniques of microelectronic devices have resulted in tremendous improvements in system functionality, performance and power consumption. These improvements have been fueled by tremendous growth in the semiconductor industry and increasing demand for hand-held and wireless electronic systems. However, these same advances also impact the stability, ...

X-ray 3d Metrology System for Sofc Development

Towards in-process x-ray CT for dimensional metrology

X-ray computed tomography (CT) offers significant potential as a metrological tool, given the wealth of internal and external data that can be captured, much of which is inaccessible to conventional optical and tactile coordinate measurement machines (CMM). Typical lab-based CT can take upwards of 30 min to produce a 3D model of an object, making it unsuitable for volume production inspection a...

Mechanics of Microelectronics Structures as Revealed by X-ray Diffraction

The presence of strain distributions within semiconductor features influences many aspects of their behavior. For example, microelectronic technology that incorporates strained silicon improves device performance by increasing carrier mobility in the Si channels. Because current semiconductor fabrication contains multiple levels of metallic and dielectric structures, an understanding of the mec...