Block copolymer nanolithography: translation of molecular level control to nanoscale patterns.
نویسندگان
چکیده
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.
منابع مشابه
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عنوان ژورنال:
- Advanced materials
دوره 21 47 شماره
صفحات -
تاریخ انتشار 2009