Title: Manufacturing Yield-driven Layout Scaling of Vlsi Ics

نویسنده

  • W. A. PLESKACZ
چکیده

This paper describes the yield estimation approach to layout scaling of submicron VLSI circuits. The presented method makes it feasible to find scaling factor of the IC design which is optimal from the manufacturing yield point of view. It allows also to reduce time-consuming extraction of the critical area functions. Examples of yield calculations using the proposed method are presented as well.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Trade-Offs between Yield and Reliability Enhancement *

Deep sub-micron VLSI technologies have led to a large increase in the number of devices per die as well as the switching speeds. These advances have been accompanied by increased design complexity and decreasing reliability. Scaling of the device dimensions has introduced “analog” effects on-chip that he causing signal integrity and delay problems. These problems are not easy to estimate and re...

متن کامل

L∞ Voronoi Diagrams and Applications to VLSI Layout and Manufacturing

In this paper we address the L∞ Voronoi diagram of polygonal objects and present applications in VLSI layout and manufacturing. We show that in L∞ the Voronoi diagram of segments consists only of straight line segments and is thus much simpler to compute than its Euclidean counterpart. Moreover, it has a natural interpretation. In applications where Euclidean precision is not particularly impor...

متن کامل

Efficient Full-Chip Yield Analysis Methodology for OPC-Corrected VLSI Designs

Degradation of lithographic pattern fidelity is a major cause of yield loss in VLSI manufacturing. A general methodology for full-chip analysis and improvement of yield loss due to lithographic effects is proposed. The approach is based on: a) extraction of pattern fidelity statistics using a full-chip layout engine, b) full-chip Optical Proximity Correction (OPC) to improve pattern reproductio...

متن کامل

Layout Design Rule Generation with TCAD Tools for Manufacturing

Thls paper presents a methodology for estimating the effects of changes in the layout design rules on the manufacturability of a VLSl technology. 2-D process and device simulations were used to estimate parametric yield, while functional yield was predicted with state-of-theart y~eld modeling tools. A spectrum of TCAD tools was therefore capable of estimating the resulting number of good chips ...

متن کامل

Improved Yield Model for Submicron Domain

This paper describes a new manufacturing yield model for submicron VLSI circuits. This model attempts to handle process induced differences between IC layout and actual IC topography. The presented model focuses on the random nature of over and under etching phenomenon. The relevance of the new yield model in submicron domain is analyzed. Examples of yield calculations using the proposed model ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 1998