Extending the Functionalities of Shear- Driven Chromatography Nano-channels Using High Aspect Ratio Etching
نویسندگان
چکیده
An new injection system is presented for shear-driven chromatography. The device has been fabricated by high aspect ratio etching of silicon. The performance of the injection slit is studied through the aid of computational fluid dynamics, and the first experimental results are presented.
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تاریخ انتشار 2010