Subband Structure of Silicon Nanowires from the Hensel-Hasegawa-Nakayama Model
نویسندگان
چکیده
The subband structure of nanowires is commonly obtained through an atomistic tight binding approach. In this work an alternative, continuum based method is investigated, namely a two-band k ·p approximation of the conduction band structure. A derivation of the subband Schrödinger equations from the bulk model and their numerical solution are presented for [100] nanowires. Self-consistent simulation results of exemplary devices are examined and the influence of confinement on the band structure is discussed. For nanowire thicknesses below ten nanometers band structure effects similar to those observed using atomistic models become apparent.
منابع مشابه
Electron subband structure in strained silicon UTB films from the Hensel–Hasegawa–Nakayama model – Part 1 analytical consideration and strain-induced valley splitting
Article history: Received 24 April 2009 Received in revised form 10 June 2009 Accepted 2 September 2009 Available online 31 December 2009 The review of this paper was arranged by Prof. O. Engström
متن کاملElectron subband structure in strained silicon UTB films from the Hensel–Hasegawa–Nakayama model – Part 2 efficient self-consistent numerical solution of the k·p schrödinger equation
Article history: Received 24 April 2009 Received in revised form 10 June 2009 Accepted 2 September 2009 Available online 29 December 2009 The review of this paper was arranged by Prof. O. Engström
متن کاملElectronic Band Structure Modeling in Strained Si-Nanowires: Two Band k ·p Versus Tight Binding
The subband structure of silicon nanowires has gained much interest recently. Nanowires with diameters below 10 nm are predicted to have a significantly altered subband structure compared with bulk silicon. The effective mass approximation fails to describe these alterings correctly, and so far the semiempirical tight binding method and first principles calculations were used to investigate the...
متن کاملNanowires fine tunable fabrication by varying the concentration ratios, the etchant and the plating spices in metal-assisted chemical etching of silicon wafer.
The metal-assisted chemical etching (MACE) was used to synthesis silicon nanowires. The effect of etchant concentration, etching and chemical plating time and doping density on silicon nanowires length were investigated. It is held that the increasing of HF and H2O2 concentrations lead to etching rate increment and formation of wire-like structure. The results show that, the appropriate ratio o...
متن کاملSubband engineering in n-type silicon nanowires using strain and confinement
We present a model based on k · p theory which is able to capture the subband structure effects present in ultra-thin strained silicon nanowires. For electrons, the effective mass and valley minima are calculated for different crystal orientations, thicknesses, and strains. The actual enhancement of the transport properties depends highly on the crystal orientation of the nanowire axis; for cer...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2010