نتایج جستجو برای: field effect semiconductor device

تعداد نتایج: 2898443  

2006
Stephan Schmid

Microfabricated semiconductor devices are essential components of many biochemical sensors today, and show great potential for advanced devices in the future. Since the proposal of an pH sensitive device, based on the technology of field effect transistors, was made in the early seventies, these so called ISFETs have been of great interest for the application in chemical and biological sensing ...

2004
S. Agosteo G. D’Angelo G. Fallica A. Fazzi A. Pola G. Valvo P. Zotto

Solid-state silicon detectors are challenging devices for microdosimetry, mainly because they can provide sensitive zones (i.e. depletion layers) of the order of a micrometer. This type of detector can be realized by placing a tissueequivalent converter in contact with a silicon device. A semiconductor microdosimeter is characterized by a high spatial and a good energy resolution and could be u...

Journal: :Nature nanotechnology 2015
Pojen Chuang Sheng-Chin Ho L W Smith F Sfigakis M Pepper Chin-Hung Chen Ju-Chun Fan J P Griffiths I Farrer H E Beere G A C Jones D A Ritchie Tse-Ming Chen

The spin field-effect transistor envisioned by Datta and Das opens a gateway to spin information processing. Although the coherent manipulation of electron spins in semiconductors is now possible, the realization of a functional spin field-effect transistor for information processing has yet to be achieved, owing to several fundamental challenges such as the low spin-injection efficiency due to...

1997
F. G. Monzon Mark Johnson M. L. Roukes

We present a new magnetoelectronic device consisting of a mm-scale semiconductor cross junction and a patterned, electrically isolated, ferromagnetic overlayer with in-plane magnetization. The large local magnetic field emanating from the edge of the thin ferromagnetic film has a strong perpendicular magnetic component, B'(r), which induces a Hall resistance, RH , in the microjunction. External...

2011
Davinder Rathee Mukesh Kumar Sandeep K. Arya

The development and optimization of Silicon technology has been guided by CMOS scaling theory [1] and predications made by Semiconductor Industry (SIA) in the International Technology Roadmap for Semiconductor (ITRS). With the trend of scaling down of Complementary Metal Oxide Semiconductor (CMOS) transistor as Moore’s Law [2] requires replacement of conventional silicon dioxide layer with the ...

2012
Faten Adel Ismael Chaqmaqchee Naci Balkan

The hot electron light emitting and lasing in semiconductor heterostructure-vertical-cavity semiconductor optical amplifier (HELLISH-VCSOA) device is based on Ga0.35In0.65 N0.02As0.08/GaAs material for operation in the 1.3-μm window of the optical communications. The device has undoped distributed Bragg reflectors (DBRs). Therefore, problems such as those associated with refractive index contra...

پایان نامه :وزارت علوم، تحقیقات و فناوری - دانشگاه یاسوج - دانشکده علوم 1391

in this investigation the effect of external field on the electron density of nanostructures of cds, cdse, cdte, gaas and polymeric structure of three, four, five and six units of cds as a kind of nanosolar cells has been studied theoretically. as modeling this system in nanodimension, molecular structures has used. specific properties of molecular structures permit us to consider different sym...

Journal: :IEEE Electron Device Letters 2007

2003
Dieter K. Schroder Jeff A. Babcock

We present an overview of negative bias temperature instability ~NBTI! commonly observed in p-channel metal–oxide–semiconductor field-effect transistors when stressed with negative gate voltages at elevated temperatures. We discuss the results of such stress on device and circuit performance and review interface traps and oxide charges, their origin, present understanding, and changes due to NB...

2005
Shinichiro Kimura

OVERVIEW: Silicon semiconductor (MOSFET: metal-oxide semiconductor field-effect transistor) dimensions are approaching the nanometer scale. The gate electrode size has already been reduced to 50 nm or less for the most advanced 90-nm technology nodes, and for the 65-nm nodes the size is expected to be 25 nm. A new guideline to replace the scaling rule is needed, and making use of the strain eff...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید