نتایج جستجو برای: mosfet

تعداد نتایج: 3069  

2010
Wei Bian Zhifeng Yan Jin He chenyue Ma Chenfei Zhang Mansun Chan

A correlation between the gated-diode R-G current and the performance degradation of SOI n-channel MOS transistor after F-N stress test has been demonstrated in this paper. Due to increase of interface traps after F-N stress test, the generation-recombination (R-G) current of the gateddiode in the SOI-MOSFET architecture increases while the performance characteristics of MOSFET transistor such ...

Journal: :IEICE Transactions 2007
Toshiro Hiramoto Toshiharu Nagumo Tetsu Ohtou Kouki Yokoyama

The device design of future nanoscale MOSFETs is reviewed. Major challenges in the design of the nanometer MOSFETs and the possible solutions are discussed. In this paper, special emphasis is placed on the combination of new transistor structures that suppress the short channel effect and on back-gate voltage control that suppresses the characteristics variations. Two new device architectures, ...

2017
Suman Sharma Rajni Shukla MR Tripathy

This paper present an extensive review of homogeneously doped Junctionless Cylindrical Gate All Around (JL-CGAA) MOSFET using numerical simulations to look into deep physical insight of the device. The electrical and analog/RF performance has been investigated. The JL-C-GAA FET is more immune to short channel effect than the devices having p-n junctions. It also offers steeper subthreshold slop...

Journal: :Microelectronics Reliability 2002
F. S. Lomeli Antonio Cerdeira

A macromodel for precise SPICE simulations of high-voltage power MOSFET is presented. The macromodel takes into account basic features of these devices as higher value of the resistance between channel and drain and lower current level though the body diode compared to low-voltage power MOSFET. It also considers that high-voltage power MOSFET work mostly in saturation regime. All required param...

Journal: :Energies 2021

4H-SiC Metal-Oxide-Semiconductor Field Effect Transistors (MOSFETs) with embedded Schottky barrier diodes are widely known to improve switching energy loss by reducing reverse recovery characteristics. However, it weakens the static characteristics such as specific on-resistance and breakdown voltage. To solve this problem, in paper, an Asymmetric Split Gate MOSFET diode (ASG-MOSFET) is propose...

پایان نامه :دانشگاه آزاد اسلامی - دانشگاه آزاد اسلامی واحد تهران مرکزی - دانشکده مهندسی 1391

دراین رساله مختصری در رابطه با فناوری نانو و کاربردهای آن پرداخته شده است. سپس ساختار اتم کربن و پیوندهای بین اتمهای آن و بویژه گرافیت، گرافن و نانولوله کربنی اعم از رسانا و نیمه رسانا که با تغییر کایرالیته بوجود می آیند و ترازهای انرژی، چگالی حالت و چگونگی ساخت نیمه هادی نوع n و p با نانولوله کربن پرداخته شده است. در ادامه ساخت ترانزیستور با استفاده از نانولوله کربن از دو نوع سد شاتکی و شبه mo...

2016
Juan M. Avalos Leon Tolbert

Efficiency is a large concern in power electronics but size and weight must be taken into consideration as well. Power devices in need of thermal sinks for appropriate performance will affect both size and weight. MOSFET devices are the main components in the power electronics world because of their comparatively promising characteristics in power loss and switching performance. The objective o...

2014
Muhibul Haque Bhuyan Quazi D. M. Khosru

Carrier scatterings in the inversion channel of MOSFET dominates the carrier mobility and hence drain current. This paper presents an analytical model of the subthreshold drain current incorporating the effective electron mobility model of the pocket implanted nano scale n-MOSFET. The model is developed by assuming two linear pocket profiles at the source and drain edges at the surface and by u...

2012
Z. Dibi F. Djeffal N. Lakhdar

In this paper, we have developed an explicit analytical drain current model comprising surface channel potential and threshold voltage in order to explain the advantages of the proposed Gate Stack Double Diffusion (GSDD) MOSFET design over the conventional MOSFET with the same geometric specifications that allow us to use the benefits of the incorporation of the high-k layer between the oxide l...

ژورنال: :مهندسی برق و الکترونیک ایران 0
نیره قبادی n. ghobadi علی افضلی کوشا a. afzali-kusha

در این مقاله با استفاده از روش حل چندبعدی معادلات واکنش-نفوذ (r-d)، مدل هایی برای پدیده ناپایداری در دمای بالا و بایاس منفی (nbti) در یک mosfet سه گیتی کانال p و پدیده تزریق حامل های پرانرژی (hci) در یک افزاره finfet سه گیتی توده کانال n ارائه می­شود. سپس نتایج حاصل از مدل با نتایج تجربی مقایسه شده و بستگی تغییرات توان زمان در مدل با ابعاد و شکل افزاره بررسی می شود. نتایج به دست آمده در مقاله ب...

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