نتایج جستجو برای: strained si nano p

تعداد نتایج: 1386055  

2017
Yeon-Tae Yu Gautam Kumar Naik Young-Bin Lim Jeong-Mo Yoon

The Si-coated SiC (Si-SiC) composite nanoparticle was prepared by non-transferred arc thermal plasma processing of solid-state synthesized SiC powder and was used as a sintering additive for SiC ceramic formation. Sintered SiC pellet was prepared by spark plasma sintering (SPS) process, and the effect of nano-sized Si-SiC composite particles on the sintering behavior of micron-sized SiC powder ...

2016
KAI ZHANG SHIYU LIU QING WANG

Improving the efficiency of optical device is important in a variety of applications. However, this process is typically done empirically. In this project, we formulate a systematically way to improve the efficiency of optical device design with machine learning. The optical device we focus on is a silicon (Si) nano-structure. This device is constructed by a series of Si nano-cells, which is re...

2006
E. Ungersboeck H. Kosina

The effect of degeneracy both on the phononlimited mobility and the effective mobility including surfaceroughness scattering in unstrained and biaxially tensile strained Si inversion layers is analyzed. We introduce a new method for the inclusion of the Pauli principle in a Monte Carlo algorithm. We show that incidentally degeneracy has a minor effect on the bulk effective mobility, despite non...

Journal: :Physica E: Low-dimensional Systems and Nanostructures 2006

2014
Seung Hwan Lee Daeyeong Lee Wan Sik Hwang Euyheon Hwang Debdeep Jena Won Jong Yoo

field-effect transistors Seung Hwan Lee, Daeyeong Lee, Wan Sik Hwang, Euyheon Hwang, Debdeep Jena, and Won Jong Yoo Department of Nano Science and Technology, SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University (SKKU), 2066 Seobu-ro, Suwon-si, Gyeonggi-do 440-746, South Korea Samsung-SKKU Graphene Center (SSGC), 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 440-746, So...

2011
Wei Zhong

PLASMA INDUCED DAMAGE TO Si AND SiGe DEVICES AND MATERIALS by Wei Zhong This thesis studied the plasma-induced damage to Si and strained Sii_„Ge,,, and the resulting change in device characteristics. The energetic particles (ions, electrons and photons) in plasma reactor present a potentially hostile environment for processing VLSI devices. An inductively coupled plasma (ICP) reactor was used t...

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