نتایج جستجو برای: plasma etching
تعداد نتایج: 364003 فیلتر نتایج به سال:
WS 2 is an emerging semiconductor with potential applications in next-generation device architecture owing to its excellent electrical and physical properties. However, the presence of inevitable surface contaminants oxide layers limits performance -based field-effect transistors (FETs); therefore, novel methods are required restore pristine surface. In this study, thickness a layer was adjuste...
The ability to sieve ions through nanopores with high throughput has significant importance in seawater desalination and other separation applications. In this study, a plasma etching process has been demonstrated to be an efficient way to produce high-density nanopores on graphene membranes with tunable size in the sub-nanometer range. Besides the pore size, the nanopore density is also contro...
Silicon nitride (Si3N4) etching using CF4/O2 mixed with N2 has become very popular in 3D NAND flash structures. However, studies on Si3N4 dry based optical emission spectroscopy (OES) are lacking; particular, no study reported the use of OES for analyzing N2-mixed plasma. Thus, this demonstrates an OES-based approach a mixed-gas plasma thin films. The state each single gas CF4, O2, and as well ...
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