We previously proposed the circular defect in two-dimensional photonic crystal (CirD) laser based on a GaAs/AlGaAs multilayer wafer, which is fabricated by dry etching. This CirD uses InAs quantum dot (QD) layers as gain medium, but this inhibits vertical improved etching process introducing three QD and three-step for fabricating laser. As result, structures with good profiles could be excelle...

The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was found to be effectively etched by the SR irradiation under the XeF(2) gas flow, and the etching process was area-s...

In this paper, a new lead-free piezoelectric (K,Na)NbO3 (KNN) film is presented as a promising, environment-friendly alternative to the conventional piezoelectric thin film materials like PZT, etc. with regard to applying into piezo-MEMS devices in general and micro-energy-harvesting devices in particular. The KNN films deposited by the RF magnetron sputtering deposition system were revealed ex...

INTRODUCTION: Treatment of osteoarthritis and rheumatoid arthritis by total joint replacement generally shows a high success rate; however challenges remain, particularly in improving revision implant fixation. Prostheses with a roughened surface inserted without cement are popular worldwide, especially for younger more active patients. Early bone ongrowth is known to be critical to long-term f...

A thin film polarization filter has been patterned and etched using reactive ion etching (RIE) in order to create 8 by 8 microns square periodic structures. The micropolarization filters retain the original extinction ratios of the unpatterned thin film. The measured extinction ratios on the micropolarization filters are approximately 1000 in the blue and green visible spectrum and approximatel...

In this study we have investigated the effect of starting GaAs semi-insulating substrate surface (polished / unpolished), type of mask used (photoresist / Nickel) and RIE parameters (pressure and power) on the surface smoothness/morphology of the etched via-walls and resultant etch profiles with CCl2F2 / CCl4 gas chemistry. The ultimate aim of the study has been to develop a reliable via-hole g...

High speed directional etching of non conventional materials like Quartz, Lithium Niobate and Lead Titanate is still insufficiently developed for producing high aspect ratio microstructures. Compared to deep silicon etching, the plasma etching of these materials has suffered from limitations in achievable depth, aspect ratio, verticality and smoothness of surfaces. Deep etching with nearly vert...

The realization of flat surfaces on the angstrom scale is required in advanced devices to avoid loss due to carrier (electron and/or photon) scattering. In this work, we have developed a new surface flattening method that involves near-field etching, where optical near-fields (ONFs) act to dissociate the molecules. ONFs selectively generated at the apex of protrusions on the surface selectively...

Dry etching is one of the elemental technologies for the fabrication of optical devices. In order to obtain the desired shape using the dry etching process, it is necessary to understand the reactivity of the materials being used to plasma. In particular, III-V compound semiconductors have a multi-layered structure comprising a plurality of elements and thus it is important to first have a full...

In this project, significant advancements have been made in creating an array of micro-polarizers using a polymer thin film in order to extract various polarization parameters about the imaged environment. The array of micro-polarizers is to be integrated with custom-made VLSI image sensor in order to create a complete low power real-time bio-inspired polarization sensitive imaging sensor. Two ...