Bulk silicon etching techniques, used to selectively remove silicon from substrates, have been broadly applied in the fabrication of micromachined sensors, actuators, and structures. Despite the more recent emergence of higher resolution, surfacemicromachining approaches, the majority of currently shipping silicon sensors are made using bulk etching. Particularly in light of newly introduced dr...

To meet the increasing market demand for optical components, Plasma Jet Machining (PJM) of Borosilicate Crown Glass (BCG), which can be an alternative to Fused Silica, is presented. Surface figure error correction was performed by applying reactive plasma jet etching, where a fluorine-containing microwave driven employed reduce in deterministic dwell-time controlled dry etching process. However...

Abstract The preparation of adsorbate‐free graphene with well‐defined layer numbers is a current challenge in materials and surface science required to fabricate graphene‐based nanodevices, such as used nanoelectromechanical systems. One strategy tailor the number oxygen‐plasma treatment few‐layer graphene/graphite flakes. However, when graphitic are stored air under ambient conditions, it almo...