نتایج جستجو برای: reactive ion etching

تعداد نتایج: 366052  

Journal: :Micromachines 2023

Reactive ion etching (RIE) is the dominating technology for micromachining semiconductors with a high aspect ratio (HAR) [...]

Journal: :Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2001

2015
Luozhou Li Tim Schröder Edward H. Chen Hassaram Bakhru Dirk Englund

The realization of efficient optical interfaces for nitrogen vacancy centers in diamond is an important problem in quantum science with potential applications in quantum communications and quantum information processing. We describe and demonstrate two techniques for fabricating one-dimensional photonic crystal cavities in single-crystal diamond, using (1) a combination of reactive ion etching ...

1995
M. Park K. R. Lane J. M. Parpia M. S. Isaacson

We have utilized several processing techniques to locally modify the superconducting transition temperature and the normal state resistivity of aluminum thin films. The techniques of ion implantation, application of a magnetic overlayer, and reactive ion etching have been used to fabricate S-N interfaces with controlled differences in transition temperatures and normal state resistances. Lithog...

1999
M. E. Lin

Reactive ion etching with SiCl, and BCls of high quality GaN films grown by plasma enhanced molecular beam epitaxy is reported. Factors such as gas chemistry, flow rate, and microwave power affecting the etching rate are discussed. The etch rate has been found to be larger with BCls than with SiC14 plasma. An etch rate of 8.5 &s was obtained with the BCl, plasma for a plasma power of 200 W, pre...

1998
Percy B. Chinoy

Reactive ion etching is a widely-used technique for fabricating via holes in polymer-metal multilayer interconnect structures. Reactive ion etching of thin film polymers was studied using Benzocyclobutene polymer and photoresist etch mask, in O2 and SF6 plasma. A design of experiments (DOE) was carried out with rf power, pressure, and SF6 concentration as the design variables, with a constant t...

Journal: :Journal of the American Chemical Society 2004
Dae-Geun Choi Hyung Kyun Yu Se Gyu Jang Seung-Man Yang

We report here a novel colloidal lithographic approach to the fabrication of nonspherical colloidal particle arrays with a long-range order by selective reactive ion etching (RIE) of multilayered spherical colloidal particles. First, layered colloidal crystals with different crystal structures (or orientations) were self-organized onto substrates. Then, during the RIE, the upper layer in the co...

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