Working youths face many safety and health risks. Among these risks are those posed by disinfectant exposures. In this study we describe acute occupational disinfectant-related illness among youth. Data on U.S. children younger than 18 years with acute occupational disinfectant-related illnesses between 1993 and 1998 were collected from the Toxic Exposure Surveillance System and from the Califo...

Langheld (1) found that sodium hypochlorite reacts with a-amino acids to form chloramino acids, which more or less readily break down to aldehydes or ketones, ammonia, carbonic acid, and sodium chloride. Milroy (2) pointed out that in the case of aromatic or heterocyclic amino acids, such as tyrosine or tryptophane, partial chlorination of the ring takes place in addition to oxidation. Hypochlo...

Virucidal agents are chemical substances that attack and inactivate viral particles outside the cell (virions). In general this is accomplished by damaging their protein shells (capsid) or the substance penetrates the core itself, where it destroys the genetic material. Damage to the virion structure is also possible. These agents are used not only for traditional surface disinfection or steril...

Three aqueous oxidants, Hydrogen peroxide, Sodium Hypochlorite and Calcium Hypochlorite were employed independently in oxidizing Chromium (III) containing tannery wastewaters to soluble chromate (CrO42-) under alkaline conditions. The amount of chromate recovered was determined via spectrophotometry. Hydrogen peroxide was potentially a suitable oxidant as it could recover chromate (CrO42-) up t...

Terrestrial orchids (Orchidaceae) have become objects of concern to conservationists due to the plants' high sensitivity to changes in its environment (Rasmussen, 1995). Surface sterilization of mature seeds before germination eliminates barriers to germination; hypochlorites are most often used for this (Lindén, 1992). The barriers include an almost waterproof testa, and embryo integuments con...

Preparation of Gallium Arsenide (GaAs) surfaces, prior to a thin-film deposition, serves the prevailing functions of lowering defectivity, contamination removal and promoting adhesion. When native oxides, metallics or particulates are a concern, the common GaAs clean includes a dilute acid (HCl, HF) or base (NH4OH). When adhesion is the primary concern, the GaAs surface may need to be roughened...