We report on a GaN metal-oxide-semiconductor field-effect-transistor (MOSFET) using atomic-layer-deposited (ALD) Al2O3 as the gate dielectric. Compared to a GaN metal-semiconductor field-effect-transistor (MESFET) of similar design, the MOSFET exhibits several orders of magnitude lower gate leakage and near three times higher channel current. This implies that the ALD Al2O3/GaN interface is of ...

In a hard drive, the bits that represent data are written with a magnetic field in close proximity to the recording surface. However, the area written and hence the information density are limited by the size of the head carrying the magnetic field, and thus other data storage methods are being explored. Chiba et al. (p. 943) report that an electrical bias can be used to enhance the magnetic pr...

Ferroelectric organic field-effect transistors (Fe-OFETs) have been attractive for a variety of non-volatile memory device applications. One of the critical issues of Fe-OFETs is the improvement of carrier mobility in semiconducting channels. In this article, we propose a novel interfacial buffering method that inserts an ultrathin poly(methyl methacrylate) (PMMA) between ferroelectric polymer ...

Intrinsic parameter fluctuations on device characteristic and yield are crucial in determining the operation of nanoscale semiconductor devices. In this paper, we examine the fluctuations of the threshold voltage (Vth), gate capacitance (Cg), and cutoff frequency (FT) of emerging metal/high-κ gate planar complementary metal-oxidesemiconductor (CMOS) field effect transistors (FETs) variability i...

It was found, that Metal Insulator Semiconductor Field Effect (MIS-FE) sensors with structures Pd-Si3N4-SiO2-Si and Pd-Ta2O5SiO2-Si have sufficient concentration resolution to H2S gas and acceptable response time in mixture of H2S gas with air. Results of MIS-FE gas sensor operation in periodic regime are presented and allow us to be sure, that low detection level of H2S for MISFE sensor with T...

In this paper, electrical characteristics of nanoscale single-, double-, and all-around-gate silicon-0n-insulator (SOI) devices are computational investigated by using a quantum mechanical simulation. Considering several important properties, such as on/off current ratio, drain induced channel barrier height lowering, threshold voltage roll off, and subthreshold swing, geometry aspect ratio is ...

Invention of Transistor is the foundation of electronics industry. Metal Oxide Semiconductor Field Effect Transistor (MOSFET) has been the key to the development of nano electronics technology. This paper offers a brief review of some of the most popular MOSFET structure designs. The scaling down of planar bulk MOSFET proposed by the Moore’s Law has been saturated due to short channel effects a...

Semiconductor genetics is now disrupting the field of healthcare owing to the rapid parallelization and scaling of DNA sensing using ion-sensitive field-effect transistors (ISFETs) fabricated using commercial complementary metal -oxide semiconductor technology. The enabling concept of DNA reaction monitoring introduced by Toumazou has made this a reality and we are now seeing relentless scaling...

Carrier transport properties of organic field effect transistors in dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene single crystals have been investigated under high pressure. In contrast to the typical pressure effect of monotonic increase in charge transfer rates according to the application of external hydrostatic pressure, it is clarified that the present organic semiconductor devices exhibi...