نتایج جستجو برای: reactive ion etching
تعداد نتایج: 366052 فیلتر نتایج به سال:
The paper proposes to use the discharge energy for synthesis of chemically active particles in order correct shape and aspherize surface optical elements by reactive ion-beam etching. A stand was assembled on basis a radio frequency source accelerated ions KLAN-105M, design which allows working with gases. possibility increasing etching rate fused quartz more than 5 times compared ion inert gas...
We report the nonselective plasma etching of epitaxial GaN:Mg, Al0.63Ga0.37N, and AlN/Al0.08Ga0.92N short-period superlattices with various doping properties. Etching is performed using mixed CF4/Ar feed gases in a combined inductively coupled plasma and reactive-ion etching chamber. A uniform etch rate of ,23 nm/min is obtained for each of the compositions studied under identical conditions. T...
This paper describes a nano-scale tensile test to study the fatigue properties of LPCVD silicon nitride thin films using a novel electrostatic actuator design. Mechanical-amplifier devices made in silicon nitride thin films can apply controllable tensile stress (2.0–7.8 GPa) to test structures with relatively low actuation voltages (5.7–35.4 VRMS) at the resonant frequencies of the devices. The...
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