Hot Filament Chemical Vapor Deposition (HFCVD) offers the ability to tailor the chemistry of films with polymeric structure. In particular, HFCVD allows for more control over precursor fragmentation pathways than conventional plasma-enhanced CVD (PECVD). HFCVD uses thermal activation in the gas phase to generate reactive species, and allows independent control of the substrate temperature to be...

A nonplasma technique, hot-filament chemical vapor deposition ~HFCVD!, is an alternative method for producing organosilicon films of novel structure. Films are deposited onto room-temperature substrates from the precursors hexamethylcyclotrisiloxane (D3) and octamethylcyclotetrasiloxane (D4) at high rates ~.1 mm/min!. Filament temperature can be used to control film structure, and the limited r...

By means of delicate and conventional methods based on photolithography and hot filament chemical vapor deposition (HFCVD) technology, a novel boron-doped diamond micro-network (BDDMN) film was fabricated, and this micro-structure showed excellent electrochemical sensing properties.

We investigated the single-walled carbon nanotubes (SWCNTs) growth on Ru nanoparticle catalyst via hot filament assisted chemical vapor deposition (HFCVD) with two independent W filaments for the carbon precursor (methane) and the hydrogen dissociation respectively. The Ru nanoparticles were obtained following a two-step strategy. At first the growth substrate is functionalized by silanisation,...

High-frequency and high-speed printed circuit boards (PCBs) are made of ceramic particles anisotropic fibres, which difficult to machine. In most cases, severe tool wear occurs when drilling high-frequency PCBs. To protect the substrate drills, diamond films typically fabricated on drills using hot filament chemical vapour deposition (HFCVD). This study investigates coating characteristics with...

A dual stage process of depositing bamboo-like carbon nanotubes (BCNTs) by hot filament chemical vapor deposition (HFCVD) and coating Si using Radio frequency sputtering (RFS) technique. The films were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and electron field emission studies (EFE)....

Dispersed nickel sulfate NiSO4 microclusters on Si substrates were fragmented by pulsed excimer laser irradiation to serve as catalysts for carbon nanotube/nanofiber CNT/CNF growth. At proper fluences, NiSO4 clusters were pulverized into nanoparticles. The sizes of clusters/nanoparticles were found to be dependent on laser fluence and laser pulse number. By increasing the laser fluence from 100...

diamond like carbon (dlc) film was grown by hot filament chemical vapor deposition (hfcvd)technique. in the present work, we investigated the quality of the dlc films groew on the substratesthat were coated with various metal nanocatalysts (au and ni). a combination of ch4/ar/h2 rendersthe growth of carbon nanostructures technique (diamond like carbon). the utilized samples werecharacterized by...