نتایج جستجو برای: ion beam machine

تعداد نتایج: 565322  

Journal: :international journal of nanoscience and nanotechnology 2012
s. f. mahmud j. taniguchi

the price of single point diamond tools with a sharp tip is very high due to complex machining process and highly expensive machining equipments. yet, the performance is not quite satisfactory. in this paper, we have presented a very simple and cost effective machining process for the sharpening and polishing of diamond stylus using low energy reactive ion beam machining (ribm). in our method, ...

Journal: :The Review of scientific instruments 2009
Paul Jansen David W Chandler Kevin E Strecker

We have developed a compact, low cost, modular, crossed molecular beam machine. The new apparatus utilizes several technological advancements in molecular beams valves, ion detection, and vacuum pumping to reduce the size, cost, and complexity of a molecular beam apparatus. We apply these simplifications to construct a linear molecular beam machine as well as a crossed-atomic and molecular beam...

ذنوبی, فرهاد, زندی, حسن, قدس, حسین , نظم آبادی, محمد, وکیلی, آزاده,

Optimizations on 200 kV electrostatic accelerator have been done in order to increasing ion current on target, improving vacuum condition and reduction in x-rays emission, increasing stability of high voltage power supply and reaching much greater achievable voltage value. The accelerator tube has most important effect on beam tracing in the electrostatic accelerators. So precautions most be co...

J. Taniguchi S. F. Mahmud

The price of single point diamond tools with a sharp tip is very high due to complex machining process and highly expensive machining equipments. Yet, the performance is not quite satisfactory. In this paper, we have presented a very simple and cost effective machining process for the sharpening and polishing of diamond stylus using low energy reactive ion beam machining (RIBM). In our method, ...

2008
José Lopes Francisco André Corrêa Luís Redondo

In this paper we present an automatic system developed for the Lisbon’s Technologic Nuclear Institute to control the operation of their particle accelerator. It is an accelerator based on a Van de Graaff machine. The system uses a personal computer running LabVIEW software which implements the procedures to automatically increase the terminal voltage, light-up the ion source and focus the parti...

1999
M. KANAZAWA M. TORIKOSHI S. YAMADA K. KAWACHI M. KUMADA T. MURAKAMI M. MURAMATSU K. NODA Y. SATO M. SHIMBO M. SUDA M. ENDO N. MATSUFUJI S. MINOHARA

Since 1994 clinical trials have been performed successfully with carbon beam. To improve the clinical result further, new irradiation systems are under development such as a 3D-irradiation system and a verification system of range with positron emitter. There are also improvements on the accelerator performances. One is the wide range of ion species; the others are concerned with the machine de...

2000
J. Bosser C. Dimopoulou A. Feschenko R. Maccaferri

A profile monitor is described that makes use of a low-intensity and low-energy ion beam to measure the transverse profile of a dense proton beam of small dimensions. Three techniques are considered based on the use of ion beams having a pencil, curtain, or cylindrical shape. The detector is almost non-interceptive for the proton beam and does not introduce disturbances in the machine environme...

2008
P. Spiller P. Hülsmann M. Kirk H. Kollmus H. Klingbeil H. Ramakers N. Pyka P. Schütt M. Schwickert J. Stadlmann

FAIR BOOSTER OPERATION U Beam Intensity In the frame of machine experiments, the maximum accelerated number of U-ions (FAIR reference ion) could be increased to 7x10 ions per cycle. In parallel, the relative amount of beam loss during the cycle has been reduced to about 30% of the injected ions (figure 1). Essentially, this progress has been enabled by a careful machine setting with an optimize...

2005
Stefano Cabrini

Highlights Focused Ion Beam Lithography is a very powerful technique for directly writing patterns on many substrates, it is a mask-less and resist-less technique that allows a very wide range of applications, providing a resolution down to 10 nm. Joined to the Electron Beam Lithography and the Gas Deposition System it became a very versatile tool for many fabrication processes. Using a dual-be...

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