نتایج جستجو برای: ellipsometry

تعداد نتایج: 2054  

Journal: :Applied spectroscopy 2013
Enric Garcia-Caurel Antonello De Martino Jean-Paul Gaston Li Yan

This article provides a brief overview of both established and novel ellipsometry techniques, as well as their applications. Ellipsometry is an indirect optical technique, in that information about the physical properties of a sample is obtained through modeling analysis. Standard ellipsometry is typically used to characterize optically isotropic bulk and/or layered materials. More advanced tec...

Journal: :Zairyo-to-Kankyo 1993

خسروی, کمیل, سنگ‌پور, پروانه, کاظم‌زاد, محمود,

In this paper, we studied the optical behavior of SiO2 thin films prepared via sol-gel route using spin coating deposition from tetraethylorthosilicate (TEOS) as precursor. Thin films were annealed at different temperatures (400-600oC). Absorption edge and band gap of thin layers were measured using UV-Vis spectrophotometery. Optical refractive index and dielectric constant were measured by ell...

2009
NATALIYA A. NIKONENKO IBRAHEEM A. BUSHNAK JOSEPH L. KEDDIE

10 11 Both visible and infrared (IR) spectroscopic ellipsometry have been employed to study the 12 structure of thin layers of bovine submaxillary mucin (BSM) adsorbed on poly(acrylic acid13 block-methyl methacrylate) (PAA-b-PMMA) copolymer and poly(methyl methacrylate) 14 surfaces at three pH values (3, 7 and 10). The adsorbed mucin layer on the copolymer surface 15 had the greatest thickness ...

Journal: :Applied optics 1975
R M Azzam M Elshazly-Zaghloul N M Bashara

A scheme of combined reflection and transmission ellipsometry on light-transmitting ambient-film-substrate systems is proposed and the required sample design and instrument operation are investigated. A comparative study of the sensitivity of external and internal reflection and transmission ellipsometry is carried out based on unified linear approximations of the exact equations. These approxi...

2009
Maria Losurdo Michael Bergmair Giovanni Bruno Denis Cattelan Christoph Cobet Antonello de Martino Karsten Fleischer Zorana Dohcevic-Mitrovic Norbert Esser Melanie Galliet Rados Gajic Dušan Hemzal Kurt Hingerl Josef Humlicek Razvigor Ossikovski Zoran V. Popovic Ottilia Saxl

This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measur...

Journal: :ACM Transactions on Graphics 2022

Ellipsometry techniques allow to measure polarization information of materials, requiring precise rotations optical components with different configurations lights and sensors. This results in cumbersome capture devices, carefully calibrated lab conditions, very long acquisition times, usually the order a few days per object. Recent polarimetric spatially-varying reflectance information, but li...

2003
Bernhard Schnyder Thomas Lippert Alexander Wokaun Vera-Maria Graubner Oskar Nuyken

UV-irradiation (172 nm) induced changes of PDMS surfaces were investigated with X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). Both methods indicate the modification of the PDMS to a silicalike surface (SiO2). These conclusions could be drawn from the elemental composition determined by XPS and the binding energy shifts in the XPS spectra of the Si 2p and O 1s level...

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