Two-Stage Chemical Deposition of Oxide Films

Chemical bath deposition of textured and compact zinc oxide thin films on vinyl-terminated polystyrene brushes

In this study we investigated the influence of an organic polystyrene brush on the deposition of ZnO thin films under moderate conditions. On a non-modified SiO x surface, island growth is observed, whereas the polymer brush induces homogeneous film growth. A chemical modification of the polystyrene brushes during the mineralization process occurs, which enables stronger interaction between the...

Potential phase control of chromium oxide thin films prepared by laser-initiated organometallic chemical vapor deposition

We have used laser-initiated chemical vapor deposition to grow the chromium oxide thin films through the oxidation of Cr~CO!6 in an oxygen environment. While both Cr2O3 and CrO2 are present in the film, the relative weight of each phase depends on the oxygen partial pressure. The Curie temperature of the film increases and approaches the bulk TC of CrO2 ~397 K! as the partial oxygen pressure is...

Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

Microstructure and optical properties of scandium oxide thin films prepared by metalorganic chemical-vapor deposition

Dense, high-index, and reproducible scandium oxide (Sc2O3) thin films with high mechanical strength were grown on glass substrates by metalorganic chemical-vapor deposition. The influence of deposition temperature on the microstructure evolution and optical properties of Sc2O3 thin films was investigated by x-ray diffraction, scanning electron microscopy, atomic-force microscopy, transmission e...

Nucleation of HfO2 atomic layer deposition films on chemical oxide and H-terminated Si

HfO2 thin films have been deposited by an atomic layer deposition ALD process using alternating pulses of tetrakis-ethylmethylamino hafnium and H2O precursors at 250 °C. The as-deposited films are mainly amorphous and nearly stoichiometric HfO2 O/Hf ratio 1.9 with low bonded carbon content 3 at. % . A comparison of the nucleation stage of the films on OHand H-terminated Si 100 surfaces has been...

Morphology control of zinc oxide films via polysaccharide-mediated, low temperature, chemical bath deposition

In this study we present a three-step process for the low-temperature chemical bath deposition of crystalline ZnO films on glass substrates. The process consists of a seeding step followed by two chemical bath deposition steps. In the second step (the first of the two bath deposition steps), a natural polysaccharide, namely hyaluronic acid, is used to manipulate the morphology of the films. Pre...