In this paper, the method of determining thermal contact resistance of wavy surfaces is discussed exactly. For determining the thermal contact resistance of real contacts, a new method has been presented. In this method, assuming a regular sinusoidal surface profile, the real contact area in terms of applied forces has been determined. Then thermal contact resistance has been calculated. Testin...

cu-mo and cu-ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. the effects of process parameters such as film thickness, annealing duration and temperat...

Cu-Mo and Cu-Ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. Deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. The effects of process parameters such as film thickness, annealing duration and temp...